User Charges
| S.N. | Facility | IITK Users | Users from any other Academics/ Govt institutions | Any Other User |
|---|---|---|---|---|
| 1 | Zeta-DLS*(per sample) *Additional Rs.200 per disposable vial | 200 | 600 | 2000 |
| 2 | Thickness analyzer (nkd)(per sample) | 100 | 300 | 1000 |
| 3 | Ellipsometer Spectroscopic data (per sample) | 1000 | 3000 | 10000 |
| 4 | Ellipsometer AOI data (per sample) | 500 | 1500 | 5000 |
| 5 | Ellipsometer Model Development (per sample) | 2000 | 6000 | 10000 |
| 6 | UV/VIS (per sample) | 200 | 600 | 2000 |
| 7 | FTIR (per sample) | 200 | 600 | 2000 |
| 8 | XRD (per 3 hr) | 500 | 1500 | 20000 |
| 9 | Reflectivity (one sample for 3h slot) | 1000 | 2000 | 20000 |
| 10 | Reciprocal space mapping (per sample) | 1000 | 3000 | 40000 |
| 11 | Contact Angle Goniometer (per sample) | 200 | 600 | 1000 |
| 12 | FESEM (SUPRA 40 VP) (1 hr slot) (EDX single point spectra) | 1500 | 4500 | 15000 |
| 13 | EDX mapping + FESEM (SUPRA 40 VP) | 1500 | 4500 | 15000 |
| 14 | SEM (EVO18) 2 hr slot | 500 | 1000 | 5000 |
| 15 | Gold coating Max. 9 samples/run | 1500 | 4500 | 15000 |
| 16 | E beam lithography (2 hr slot) | 5000 | 10000 | 30000 |
| 17 | NKD (per sample) | 200 | 600 | 2000 |
| 18 | Ball Milling | 1000 | 3000 | 10000 |
| 19 | Crimping Machine (1 Hour) | 100 | 300 | 1000 |
| 20 | Glove Box (1 Hour) | 500 | 1500 | 5000 |
| 21 | Roller | 100 | 300 | 1000 |
| 22 | BAM | 1000 | 3000 | 10000 |
Equipment charges (INR):
| S.N. | Facility | IITK Users | Users from any other Academics/ Govt institutions | Any Other User |
|---|---|---|---|---|
| 1 | RIE/Oxygen/Argon plasma (1h slot) | 500 | 1500 | 5000 |
| 2 | E-Beam Deposition (3hr slot) | 2000 | 6000 | 20000 |
| 3 | Sputtering Available Targets : TiO2, ZnO, Cu, Cr, Fe |
2000 | 6000 | 20000 |
| 4 | Photoresist Coating/ Processing | 1000 | 2000 | 10000 |
| 5 | Direct Laser Patterning (Dilase 250), Photolithography | 1000 | 3000 | 10000 |
| 6 | SF-100 Xpress Photolithography | 1000 | 3000 | 10000 |
| 7 | SF-100 Photolithography | 1000 | 3000 | 10000 |
| 8 | Nano Imprint Lithography (NIL) per sample | 1000 | 3000 | 10000 |
| 7 | UV-KUB2 Photolithography | 1000 | 3000 | 10000 |
| 9 | Furnace (vacuum) | 500 | 1500 | 5000 |
| 10 | Furnace (H2/N2/Ar) | 500 | 1500 | 5000 |
| 11 | Vacuum oven (per hr) | 100 | 300 | 1000 |
| 12 | Electrospinning (5h slot) | 1000 | 3000 | 10000 |
| 13 | Optical Microscope (1h slot) | 200 | 600 | 2000 |
| 14 | Fluorescence Microscope | 1000 | 3000 | 10000 |
| 15 | Spin Coater | 200 | 600 | 1000 |
| 16 | Harrik Plasma | 200 | 600 | 2000 |
| 17 | UV Ozone | 200 | 600 | 2000 |
| 18 | Inverted Microscope | 200 | 600 | 2000 |
Charges for various AFM modes (INR):
| S.N. | Facility | IITK Users | Users from any other Academics/ Govt institutions | Any Other User |
|---|---|---|---|---|
| 1 | Tapping mode/Contact Mode | 2000 | 6000 | 20000 |
| 2 | Force Map | 2500 | 7500 | 25000 |
| 3 | AMFM | 3000 | 9000 | 30000 |
| 4 | Liquid Contact mode | Actual number of probes used (3000 per probe) + usage charge 2000/- for 3h | Actual number of probes used (9000 per probe) + usage charge 6000/- for 3h | Actual number of probes used (30000 per probe) + usage charge 20000/- for 3h |
| 5 | Liquid Force Map | Actual number of probes used (3000 per probe) + usage charge 2000/- for 3h | Actual number of probes used (9000 per probe) + usage charge 6000/- for 3h | Actual number of probes used (30000 per probe) + usage charge 20000/- for 3h |
| 6 | Electric Mode | 2000 | 6000 | 20000 |
| 7 | MFM Mode | 2500 | 7500 | 25000 |
| 8 | STM | 2000 | 6000 | 20000 |
| 9 | PFM | Actual number of probes used (3000 per probe) + usage charge 2000/- for 3h | Actual number of probes used (9000 per probe) + usage charge 6000/- for 3h | Actual number of probes used (30000 per probe) + usage charge 20000/- for 3h |